Integrated optics based on silicon-on-insulator
platforms are developing extremely fast due to technological compatibility with
complementary metal-oxide-semiconductor (CMOS) fabrication process widely
accepted in microelectronics.
Wayne State researchers have developed a technology
which generates an integrated optical polarizer for high index contrast SOl
waveguides, which operates through resonant coupling of TM-polarized guided mode
to a high-index mode supported by a nanoscale metal dielectric multilayer, such
as gap plasmon-polariton.
This new technology of several nano-scale
metal-dielectric layers on top of a SOI waveguide enables the integrated optical
polarizer’s to be integrated into many silicon photonic devices.
Commercial Applications
• Fiber-optic communications industry
• Integrated optical systems, including optical multiplexers/
demultiplexers using array waveguide gratings, integrated optical modulators,
filters, interferometers
Competitive Advantages
• Strong coupling together with high optical losses allows for operation
with a 3 times wider spectrum range
• Footprint is 5 times smaller compared to competitive devices
Publications
I.Avrutsky, I. Sala'khutdinov, J. Elser, V. Podolskiy, "Highly confined
optical modes in nano scale metal-dielectric multilayers," Physical Review B,
75, Art. No. 241402 R (2007).
Patent Status
Patent Pending