Technology
Overview
Wayne State
University researchers have developed a new class of thermally stable, volatile
transition chemical compounds that have desirable properties for the growth of
thin films of transition metal-containing materials. These novel film precursors have high
potential for use in the growth of thin films by chemical vapor deposition
(CVD), atomic layer deposition (ALD), and related film growth technologies.
ALD processes require
precursors that are thermally stable at the deposition temperature. Currently there are few precursors
available that have sufficient thermal stability to be used in ALD. Our compounds exhibit higher thermal
stability than existing classes of precursors, allowing uses in both CVD and
ALD.
Commercial
Applications
·
Growth
of thin films by ALD or CVD
·
Manufacturing
of microelectronics
·
Applications
in the automotive, industrial, communication, and consumer electronics
industries
Competitive
Advantage
·
Our
compounds exhibit higher thermal stability than existing classes of film growth
precursors, making them suitable to a wider range of
applications.
Patent
Status
Patent
Pending
Market
Status/Potential Competitive Landscape
·
The
microelectronics industry is very interested in ALD precursors for use in thin
film battery applications
·
ALD processes have been successfully demonstrated for several metal
compounds, but for only very few pure metals