Volatile Thermally Stable Transition Metal Precursors for Thin Film Growth

Case ID:
09-935

Wayne State researchers have developed a new class of thermally stable, volatile transition chemical compounds that have desirable properties for the growth of thin films of transition metal-containing materials by atomic layer deposition and chemical vapor deposition.

Commercial Applications

• Microelectronic devices

     o Automotive applications

     o Industrial applications

     o Consumer electronics

     o Communications

     o Computers and peripherals

• Thin film batteries

• Protective and decorative coatings

Competitive Advantages

• Thermal stability at higher temperatures than existing classes of film growth precursors

• New precursors allow film growth over a broader temperature range than other classes of precursors

• Precursors have simple chemical structures, can be prepared from inexpensive reagents, and are easily purified and manipulated.

Patent Status

Patent Pending

Patent Information:
For Information, Contact:
Nicole Grynaviski
Commercialization Principal
Wayne State University
nicole.grynaviski@wayne.edu
Inventors:
Charles Winter
Mahesh Karunrathne
Keywords:
Batteries
Coatings
Electronics