Wayne State researchers have developed a new class of thermally stable, volatile transition chemical compounds that have desirable properties for the growth of thin films of transition metal-containing materials by atomic layer deposition and chemical vapor deposition.Commercial Applications
• Microelectronic devices o Automotive applications o Industrial applications o Consumer electronics o Communications o Computers and peripherals• Thin film batteries• Protective and decorative coatings
Competitive Advantages
• Thermal stability at higher temperatures than existing classes of film growth precursors• New precursors allow film growth over a broader temperature range than other classes of precursors• Precursors have simple chemical structures, can be prepared from inexpensive reagents, and are easily purified and manipulated.
Patent Status
Patent Pending